Alloy RS-5406
Designation
Description
Alloy RS-5406 is used: for the manufacture by vacuum-thermal deposition of thermally stable, thin-film resistive elements and various auxiliary layers of electronic devices; for low-impedance resistive layers with a wide range of resistivity and positive temperature coefficient of resistance of the order of 10-5 deg-1, with corrosion resistance and ability to adhesion, a method of explosive evaporation from the tungsten evaporator.
Note
Silicon alloy resistive.
Standards
Chemical composition
Cr is the basis.