Alloy RS-3001
Designation
Description
Alloy RS-3001 is used: for the manufacture by vacuum-thermal deposition of thermally stable, thin-film resistive elements and various auxiliary layers of electronics products; for precision resistive layers of thin-film electronic devices private appointment by a method of evaporation of batches of powder with a tungsten evaporator.
Note
Silicon alloy resistive.
Standards
Chemical composition
Si is the basis.