Powder material S2
Designation
Description
Powder material C2 is used: for the manufacture by powder metallurgy of various components (plates, rings, discs, nozzles and other products according to the drawings) and designed to work in conditions of abrasive and hydroabrasive wear in friction pairs, as well as parts of moulds for hot pressing at temperatures up to 1350 °C.
Products may not be used in alkaline media.
Note
The material on the basis of carbide of silicon.
Standards
Chemical composition
SiC (silicon carbide) is the basis
According to TU 14-1-4909-90, the chemical composition is given for C2-based powder material on the basis of self-bonded silicon carbide for parts of hot pressing molds. For the material C2 intended for the production of other products, the mass fraction of free silicon in the material is not more than 22.00%, the mass fraction of free carbon is not more than 1.30%.
According to TU 14-1-4909-90, the chemical composition is given for C2-based powder material on the basis of self-bonded silicon carbide for parts of hot pressing molds. For the material C2 intended for the production of other products, the mass fraction of free silicon in the material is not more than 22.00%, the mass fraction of free carbon is not more than 1.30%.